Affordable Access

Carbon mediated reduction of silicon dioxide and growth of copper silicide particles in uniform width channels

Authors
Publisher
American Institute of Physics
Publication Date
Keywords
  • We Show That Surface Arc-Discharge Deposited Carbon Plays A Critical Intermediary Role In The Breakd
  • Resulting In The Formation Of Epitaxial Copper Silicide Particles In ≈ 10 μM Wide Channels
  • Which Are Aligned With The Intersections Of The (100) Surface Of The Wafer And The {110} Planes On A
  • As Well As Endotaxial Copper Silicide Nanoparticles Within The Wafer Bulk
  • We Apply Energy Dispersive X-Ray Spectroscopy
  • In Combination With Scanning And Transmission Electron Microscopy Of Focused Ion Beam Fabricated Lam

Abstract

Carbon mediated reduction of silicon dioxide and growth of copper silicide particles in uniform width channels - DTU Orbit (16/05/14) Carbon mediated reduction of silicon dioxide and growth of copper silicide particles in uniform width channels - DTU Orbit (16/05/14) Pizzocchero, Filippo, Peter Bøggild, and Tim Booth. "Carbon mediated reduction of silicon dioxide and growth of copper silicide particles in uniform width channels". Journal of Applied Physics. 2013, 114(11). 114303.

There are no comments yet on this publication. Be the first to share your thoughts.