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Relaxation in amorphous materials: A new approach

Authors
Journal
Materials Science and Engineering A
0921-5093
Publisher
Elsevier
Publication Date
Volume
133
Identifiers
DOI: 10.1016/0921-5093(91)90130-f

Abstract

Abstract The structure of amorphous materials has successfully been described by a lognormal cluster model, and the relaxation process treated on this basis. The model allows a new interpretation of atomic diffusion in amorphous materials. This diffusion has a low-dimensional path through randomly distributed barriers. Results of NMR relaxation time and internal friction peak measurements are explained on this basis.

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