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Structural, optical and electrical characterizations of μc-Si:H films deposited by PECVD

Authors
Journal
Solar Energy Materials and Solar Cells
0927-0248
Publisher
Elsevier
Publication Date
Volume
87
Identifiers
DOI: 10.1016/j.solmat.2004.07.026
Keywords
  • Microcrystalline Silicon
  • Transport Properties
  • Structural Properties
Disciplines
  • Chemistry

Abstract

Abstract The effects of the silane concentration f on the structural, optical and electrical properties of undoped hydrogenated silicon films prepared in a plasma-enhanced chemical vapour deposition system have been studied. The electrical conductivity and Hall mobility appear to be controlled by microstructures induced by silane concentration and a clear electrical transport transition from crystalline to amorphous phase has been found when 3%< f<4%. A two-phase model has been used to discuss the electrical properties.

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