Affordable Access

Publisher Website

Laser Induced Nanoablation of Diamond Materials

Authors
Journal
Physics Procedia
1875-3892
Publisher
Elsevier
Publication Date
Volume
12
Identifiers
DOI: 10.1016/j.phpro.2011.03.103
Keywords
  • Laser
  • Ablation
  • Oxidation
  • Diamond
  • Nanoprocessing
Disciplines
  • Chemistry

Abstract

Abstract Possibility of ultra-precise laser induced ablative etching of diamond materials was investigated. Different types of lasers were used. Natural sigle crystal diamond, poly and nanocrystalline CVD diamond, amorphous diamond-like films were irradiated in air and vacuum at laser fluencies 0.01÷20 J/cm2. It is found that depending on material, laser fluence and wavelength physical and chemical regimes of materials ablation can be realized. The role of surface graphitization and oxidation, charge carriers generation in diamond is studied. It is shown that ablation rates as low as 10-3-10-4 nm/pulse can be realized and such processing regimes were applied to diamond surface nanostructuring.

There are no comments yet on this publication. Be the first to share your thoughts.

Statistics

Seen <100 times
0 Comments

More articles like this

Theory for the laser-induced instability of the di...

on Progress in Surface Science Jan 01, 1990

Excimer laser-induced electron emission from diamo...

on Diamond and Related Materials Jan 01, 1997

Laser-induced phase transitions in ion-implanted d...

on Diamond and Related Materials Jan 01, 2003

Laser-induced luminescence of xenon implanted natu...

on Journal of Luminescence Jan 01, 2004
More articles like this..