Affordable Access

Publisher Website

Plasma-enhanced chemical vapor deposition of molybdenum

Authors
Journal
Thin Solid Films
0040-6090
Publisher
Elsevier
Publication Date
Volume
147
Issue
2
Identifiers
DOI: 10.1016/0040-6090(87)90284-7
Disciplines
  • Chemistry

Abstract

Abstract The plasma-enhanced chemical vapor deposition of molybdenum films from Ar-Mo(CO) 6 gas mixtures and H 2-Mo(CO) 6 gas mixtures was studied. Films deposited from the former mixture contain large quantities of carbon and oxygen before and after annealing, while their sheet resistance remained beyond the range of the four-point probe used here. As-deposited films from the latter mixture contain carbon, but oxygen is present apparently in the form of a hydroxide. On annealing, the resistivity reaches a minimum of 7.5 μΩ cm and oxygen is no longer present in the film.

There are no comments yet on this publication. Be the first to share your thoughts.