Affordable Access

Publisher Website

Deposition rate of Ag on NaCl substrate in high temperature Ar gas of low concentration

Authors
Journal
Applied Surface Science
0169-4332
Publisher
Elsevier
Publication Date
Volume
75
Identifiers
DOI: 10.1016/0169-4332(94)90144-9

Abstract

Abstract Deposition rates of Ag thin films on NaCl substrates in Ar gas (900 K, 1.0 Pa) are calculated on a couple of conditions of Ag flow from an evaporation source (evaporation rate: 1.0 mg/s, source-to-substrate distance: 90 mm). In case of radial flow from the source, the Ag deposition rate is estimated to be 3.7 nm/s on the substrate fixed on a plate of wide plane surface. Another rate of 0.1 nm/s is obtained on the substrate fixed in a cylindrical box. The results suggest that there exist Ag flux concentrations in regions near these substrates.

There are no comments yet on this publication. Be the first to share your thoughts.