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Absolute surface metrology by rotational averaging in oblique incidence interferometry.

Authors
  • Lin, Weihao
  • He, Yumei
  • Song, Li
  • Luo, Hongxin
  • Wang, Jie
Type
Published Article
Journal
Applied Optics
Publisher
The Optical Society
Publication Date
Jun 01, 2014
Volume
53
Issue
16
Pages
3370–3378
Identifiers
DOI: 10.1364/AO.53.003370
PMID: 24922410
Source
Medline
License
Unknown

Abstract

A modified method for measuring the absolute figure of a large optical flat surface in synchrotron radiation by a small aperture interferometer is presented. The method consists of two procedures: the first step is oblique incidence measurement; the second is multiple rotating measurements. This simple method is described in terms of functions that are symmetric or antisymmetric with respect to reflections at the vertical axis. Absolute deviations of a large flat surface could be obtained when mirror antisymmetric errors are removed by N-position rotational averaging. Formulas are derived for measuring the absolute surface errors of a rectangle flat, and experiments on high-accuracy rectangle flats are performed to verify the method. Finally, uncertainty analysis is carried out in detail.

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