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Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering

Authors
Journal
Nanoscale Research Letters
1931-7573
Publisher
Springer (Biomed Central Ltd.)
Publication Date
Volume
8
Issue
1
Identifiers
DOI: 10.1186/1556-276x-8-297
Keywords
  • Nano Express

Abstract

The nanomechanical properties of BiFeO3 (BFO) thin films are subjected to nanoindentation evaluation. BFO thin films are grown on the Pt/Ti/SiO2/Si substrates by using radio frequency magnetron sputtering with various deposition temperatures. The structure was analyzed by X-ray diffraction, and the results confirmed the presence of BFO phases. Atomic force microscopy revealed that the average film surface roughness increased with increasing of the deposition temperature. A Berkovich nanoindenter operated with the continuous contact stiffness measurement option indicated that the hardness decreases from 10.6 to 6.8 GPa for films deposited at 350°C and 450°C, respectively. In contrast, Young's modulus for the former is 170.8 GPa as compared to a value of 131.4 GPa for the latter. The relationship between the hardness and film grain size appears to follow closely with the Hall–Petch equation.

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