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Influence of ultrathin templates on the epitaxial growth of CrSi2on Si(0 0 1)

Authors
Publisher
Elsevier B.V.
Publication Date
Volume
76
Identifiers
DOI: 10.1016/j.mee.2004.07.034
Keywords
  • Silicides
  • Chromium
  • Mbe
  • Template

Abstract

Abstract Structural investigations were performed to analyse the influence of ultrathin silicide layers (templates) on the quality of epitaxial CrSi 2 films (thickness of about 40 nm), which were subsequently grown by reactive codeposition on top of these templates. X-ray diffraction and reflectometry, Rutherford backscattering spectrometry (RBS), transmission and scanning electron microscopy were used to characterize orientation, crystalline quality and morphology of the CrSi 2 films on Si(0 0 1). The templates were formed at a Cr thickness t Cr ranging from 0.20 to 1.00 nm. It was shown that reactive codeposition onto templates, grown at 0.35 nm ⩽ t Cr ⩽ 0.52 nm, leads to the formation of smooth, homogeneous in thickness epitaxial layers. An RBS minimum yield of about 18% was observed for these samples. The investigation of a thin silicide template ( t Cr = 0.4 nm) has shown that it consists of separated crystallites with two epitaxial orientations: CrSi 2(0 0 1)[1 0 0]∥Si(0 0 1)[1 1 0] and CrSi 2 ( 1 1 2 ) [ 1 1 ¯ 0 ] ∥ Si ( 0 0 1 ) [ 1 1 0 ] . The thicker CrSi 2 film, grown on top of this template, reproduces its morphology and orientation.

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