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Fabrication of two-dimensional magnetic arrays using CMOS process

Authors
Journal
Current Applied Physics
1567-1739
Publisher
Elsevier
Publication Date
Volume
9
Issue
2
Identifiers
DOI: 10.1016/j.cap.2008.12.059
Keywords
  • Magnetic Arrays
  • Fabrication
  • Cmos Process
  • Lithography
  • Wet-Etching
  • Co

Abstract

Abstract We fabricated two-dimensional (2-D) Co magnetic arrays starting from a 40-nm-thick Co layer on a 6-in. Si wafer by photolithography with a KrF laser source and the wet-etching process. Various patterns, including square and triangular lattices, were achieved, with their smallest feature size ranging from 300 to 800 nm. In this paper, we present the key processes to prepare nano-scaled 2-D magnetic arrays and the fabricated structures, along with their magnetic properties.

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