Interpretation of quantitative crystallographic texture in copper electrodeposits on amorphous substrates

Affordable Access

Interpretation of quantitative crystallographic texture in copper electrodeposits on amorphous substrates

Authors
Publisher
Electrochemical Society, Inc.
Keywords
  • Crystallographic Texture And Morphology In Cu Electrodeposits Was Studied In Relation To The Current
  • The Substrate Onto Which Cu Was Electrodeposited Consisted Of Amorphous Ni-P In Order To Allow Subst
  • Comprehensive X-Ray Diffraction Studies Of The Crystallographic Texture
  • Including Calculations Of The Three-Dimensional Orientation Distribution Function
  • Were Performed And Accompanied By Investigations Of The Deposit Morphology By Means Of Light Optical
  • Electrodeposits With Totally Different Microstructures Having The Same Main Crystallographic Orienta
  • For Interpretation Of The Results
  • Not Only The Original Growth Behavior In Direct Dependence On The Applied Process Parameters
  • But Also Process Dependent Self-Annealing Effects (Recrystallization) Of The As-Deposited Layers Wer
  • (C) 2003 The Electrochemical Society

Abstract

Interpretation of quantitative crystallographic texture in copper electrodeposits on amorphous substrates - DTU Orbit (10/03/14) Interpretation of quantitative crystallographic texture in copper electrodeposits on amorphous substrates - DTU Orbit (10/03/14) Interpretation of quantitative crystallographic texture in copper electrodeposits on amorphous substrates Pantleon, K., Jensen, J. A. D. & Somers, M. A. J. 2004 In : Electrochemical Society. Journal. 151, 1, p. C45-C51 Publication: Research - peer-review › Journal article – Annual report year: 2004

There are no comments yet on this publication. Be the first to share your thoughts.