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Oxidation behaviour of TiAlN coatings sputtered at low temperature

Authors
Journal
Vacuum
0042-207X
Publisher
Elsevier
Publication Date
Volume
53
Identifiers
DOI: 10.1016/s0042-207x(98)00407-2
Keywords
  • Hard Coatings
  • Low Temperature Coatings
  • Oxidation Resistance
  • Reactive Sputter Deposition
Disciplines
  • Engineering

Abstract

Abstract The basic mechanical and structural properties, as well as the oxidation behaviour of Ti 1- x Al x N coatings sputtered at low temperature are reported. Ti 1- x Al x N coatings of four different compositions were sputter deposited in a Sputron (Balzers) plasma-beam sputtering apparatus at a temperature below 200°C. Polished tool steel discs, silicon wafers and polished alumina ceramics were used as substrates. Oxidation of coatings was carried out by heating the samples at temperatures of 700–900°C in an oxygen atmosphere for selected times. The surface and fracture cross-sectional morphology of the as-deposited and oxidized films were studied by scanning electron microscopy, while the structure of the coatings was examined by the XRD and TEM techniques.

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