Affordable Access

Publisher Website

Photoinduced annihilation of σ bonds in amorphous poly(methylphenylsilane)

Journal of Non-Crystalline Solids
Publication Date
DOI: 10.1016/0022-3093(95)00784-9


Abstract The photoinduced annihilation of σ bonds in poly(methylphenylsilane) (PMPS) films has been studied by prolonged exposure to 325 nm light at room temperature. The transparency of the film begins to increase significantly after an exposure time, t T. The decay profile of the absorption after t T confirms the presence of a thermally activated process in the photoscission of σ bonds. Photoluminescence measurements show a decay of the σ∗−σ emission and a slight increase in a peak at 530 nm (ascribable to the π∗−σ emission) before t T. The former is explained by the diffusion of photogenerated holes and the creation of nonradiative recombination centers by them. The latter is discussed by the accumulation of σ bonds which interact with phenyl-π electrons and have higher activation energy for the photoscission than the others.

There are no comments yet on this publication. Be the first to share your thoughts.