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Femtosecond pulsed laser deposition of silicon thin films

Authors
Publisher
Springer
Publication Date
Volume
8
Issue
1
Identifiers
DOI: 10.1186/1556-276x-8-272
Keywords
  • Nano Express
Disciplines
  • Design

Abstract

Optimisation of femtosecond pulsed laser deposition parameters for the fabrication of silicon thin films is discussed. Substrate temperature, gas pressure and gas type are used to better understand the deposition process and optimise it for the fabrication of high-quality thin films designed for optical and optoelectronic applications.

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