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Alloy formation at the deposition of palladium on gold at room temperature

Authors
Journal
Journal of Electroanalytical Chemistry
0022-0728
Publisher
Elsevier
Publication Date
Volume
125
Issue
2
Identifiers
DOI: 10.1016/s0022-0728(81)80354-3

Abstract

Abstract Palladium is shown to be deposited underpotentially on gold electrodes in 1 M H 2OSO 4. The deposit forms an alloy according to a t 1/2 law. The rate of alloy formation is strongly dependent on the potential. The diffusion coefficient is about 10 −16 cm 2 s −1. This value is discussed in comparison with earlier measurements on gold-palladium alloys at higher temperatures.

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