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Morphological properties of chemical vapour deposited AlN films

Authors
Journal
Journal of Crystal Growth
0022-0248
Publisher
Elsevier
Publication Date
Volume
133
Identifiers
DOI: 10.1016/0022-0248(93)90103-4

Abstract

Abstract In this paper we analyse some results on AIN CVD film deposition, published in the literature, from a morphological point of view, and we propose a model to explain the observed preferential orientations based on the reactivity of the AIN crystal faces of the equilibrium form.

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