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Some trends in preparing film structures by ion beam methods

Authors
Journal
Thin Solid Films
0040-6090
Publisher
Elsevier
Publication Date
Volume
50
Identifiers
DOI: 10.1016/0040-6090(78)90099-8
Disciplines
  • Medicine

Abstract

Abstract Film deposition by ion beam sputtering or condensation offers interesting possibilities for the preparation of special layer structures because activation energy can be supplied to the growing film in a defined manner. Some results of recent work on the ion beam sputtering of Nb x Ge y under ultrahigh vacuum conditions using in situ diagnostics and on the dual beam deposition of Si 3N 4 and diamond-like carbon are presented. Further trends are discussed in connection with methods of condensing low energy ions.

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