Abstract A multifractal (MF) method is used for analysis of areas of spatial forms on the surface of thin layers of ZnxCd1−xTe solid solution grown on the Si (111) substrate by a method of the hot-wall epitaxy. AFM images of the film surface are considered as input information for the MF analysis. The parameters of the MF spectra of the film surface are obtained. It is shown that the MF parameters correspond to their canonical forms, and the developed computational approach can be applied to describe and analyze the spatial fractal structures formed on a layer surface. The quantitative relationships between the MF spectrum parameters of a film surface and its growth conditions are found.