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Surface microstructure and growth morphology of vacuum deposited a-As2S3thin films

Authors
Journal
Journal of Non-Crystalline Solids
0022-3093
Publisher
Elsevier
Publication Date
Volume
139
Identifiers
DOI: 10.1016/s0022-3093(05)80829-4

Abstract

Vacuum deposited a-As 2S 3 thin films prepared under various experimental conditions are studied by conventional transmission and scanning electron microscopy. It is shown that general grain growth phenomena occur on the film free surface during the deposition process. The influence of the deposition rate, the substrate to evaporation source arrangement and the type of the substrate on the surface morphology is demonstrated. The formation of column-like internal film structure is shown by observations of the sample growth profiles. Thus, first evidence for the presence of microstructural inhomogeneity in vapor-deposited a-As 2S 3 thin films is obtained.

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