Affordable Access

Publisher Website

Temperature dependence of CH radical reactions with H2O and CH2O

Authors
Journal
Symposium (International) on Combustion
0082-0784
Publisher
Elsevier
Publication Date
Volume
21
Issue
1
Identifiers
DOI: 10.1016/s0082-0784(88)80303-5
Keywords
  • Reaction Kinetics
Disciplines
  • Physics

Abstract

The temperature dependence of the reactions CH+H 2O and CH+CH 2O were studied from 297 to 670 K in 100 torr of argon using the two-laser photolysis/LIF probe technique. The CH radicals were produced by the multiphoton dissociation of CHBr 3 at 266 nm and monitored by LIF at 429.8 nm. The reaction CH+H 2O is independent of total pressures between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(9.49±0.05)×10 −12exp[(380±20)/T] cm 3s −1 for the temperature range 298 to 669 K. The reaction CH+CH 2O is also independent of total pressure between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(1.57±0.14)×10 −10 exp[(260±30) T] cm 3s −1 for the temperature range 297 to 670 K. The negative activation energies, energetics, and known CH behavior point to CH insertion into both H 2O and CH 2O as the primary reaction paths. The insertion products undergo rapid decomposition and collisional stabilization is unable to compete under these conditions.

There are no comments yet on this publication. Be the first to share your thoughts.