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Thermal conductivity of thin SiO2films

Authors
Journal
Thin Solid Films
0040-6090
Publisher
Elsevier
Publication Date
Volume
207
Identifiers
DOI: 10.1016/0040-6090(92)90123-s
Disciplines
  • Chemistry
  • Mathematics

Abstract

Abstract On the basis of a mathematical model developed here, thermal conductivities were determined in silicon oxide films of four thicknesses. The films were deposited by plasma-enhanced chemical vapor deposition on monocrystalline silicon substrates. Heat losses by convection and radiation were minimized. The conductivities of the films are significantly lower than those of bulk SiO 2. As the film thickness decreases, the thermal conductivity is lowered considerably.

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