Affordable Access

Publisher Website

Pure-Silica-Zeolite Low-Dielectric Constant Materials-Chapter 13

Elsevier B.V.
DOI: 10.1016/b978-0-444-53189-6.00013-5
  • Chemistry


Publisher Summary This chapter focuses on the latest developments in the synthesis and characterization of pure-silica-zeolites as low-k materials. To reduce the resistance component of the RC (resistanceā€“capacitance) delay, the semiconductor industry has developed a Damascene process to switch from aluminum to copper. The capacitance comes into play in the dielectric material, which has traditionally been dense silica with a dielectric constant (k) of about 4. A number of new low-k materials with a variety of chemical compositions have been evaluated. Two important factors in their exploration are the polarizability and number density of the materials' molecules; ideally, both quantities should be low. Three major classes of materials have been studied: organic polymers, carbon-doped oxides and silica-based materials. Zeolites are microporous crystalline oxides that have traditionally been used as catalysts in the oil refining industry, and they contain a number of desirable attributes that make them a suitable replacement low-k material. Recently, new and novel applications for zeolite thin films have been developed. Zeolite films can be prepared through several methods including in situ, seeded growth and spin-on techniques. The films are characterized for k value, pore structure, hydrophobicity, and mechanical properties. PSZ thin films have been shown to be promising candidates for new low-k materials. Their spin-on deposition process and silica chemical composition allow PSZs to be easily integrated into the semiconductor manufacturing process, revealing a k value of 1.5. This meets the necessary requirements for a low-k material. Before they can be completely accepted as a suitable low-k alternative, other properties of PSZs must be fully characterized and optimized. These include, but are not limited to, thermal properties, electrical properties, and chemical compatibility.

There are no comments yet on this publication. Be the first to share your thoughts.


Seen <100 times