Affordable Access

100 nm period grating by high-index phase-mask immersion lithography

Authors
Publisher
Optical Society of America
Publication Date
Disciplines
  • Design

Abstract

The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film under immersion. The paper describes the phase mask design, its fabrication, the effect of electron-beam lithographic stitching errors and optical assessment of the fabricated sub-cutoff grating.

There are no comments yet on this publication. Be the first to share your thoughts.