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Magnetron sputter deposition and characterisation of Ti/TiN, Au/TiN and MoSX/Pb multilayers

Authors
Journal
Surface and Coatings Technology
0257-8972
Publisher
Elsevier
Publication Date
Identifiers
DOI: 10.1016/s0257-8972(97)00431-3
Keywords
  • Magnetron Sputter Deposition
  • Ti/Tin
  • Au/Tin
  • Mosx/Pb

Abstract

Abstract Pure TiN and MoS X, as well as Au/TiN, Ti/TiN and MoS X/Pb multilayers (multilayer layer thickness 4–50 nm), have been prepared by magnetron sputtering at room temperature. The characteristics of these films have been investigated using atomic force microscopy, X-ray diffraction and reflection, Auger depth profiling and Rutherford backscattering. The wear properties of the films have been determined using pin-on-disc measurements and the hardness of the films have been examined using nanoindentation techniques. Results show that the mechanical properties depend on multilayer thickness and that oxygen contamination from the background vacuum result in a degradation of film performance.

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