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Surface chemistry and optical property of TiO2thin films treated by low-pressure plasma

Authors
Journal
Journal of Solid State Chemistry
0022-4596
Publisher
Elsevier
Publication Date
Volume
180
Issue
10
Identifiers
DOI: 10.1016/j.jssc.2007.06.037
Keywords
  • Optical Property
  • Thin Film
  • Tio2
  • Surface States
  • Plasma Treatment
Disciplines
  • Chemistry

Abstract

Abstract The low temperature RF plasma treatment was used to control the surface chemistry and optical property of TiO 2 thin films deposited by RF magnetron sputtering with a very good uniformity at 300 °C substrate heating temperature. The XRD pattern indicates the crystalline structure of the film could be associated to amorphous structure of TiO 2 in thin film. The plasma treatment of TiO 2 film can increase the proportion of Ti 3+ in Ti2 p and decrease in carbon atoms as alcohol/ether group in C1 s at the surface. The optical transmittance of the film was enhanced by 50% after the plasma treatment. The surface structure and morphology remain the same for untreated and low-pressure plasma-treated films. Therefore, increase in the optical transmission could be due to change in surface chemistry and surface cleaning by plasma treatment.

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