Abstract Fluorine-doped CdS films were deposited on glass substrates at 70°C by chemical bath deposition using HF as fluorine source. The as-grown films were immersed in a 0.25M CdCl2 solution and annealed at 400°C in a nitrogen atmosphere. Effects of doping and post-deposition treatment on structural, topography, optical and electrical properties were investigated. The post-deposition treatment causes an increase in the grain size, a decrease in the rms roughness and a reduction in the resistivity of the CdS:F films. After treatment a CdS:F film with a roughness of 2.39nm and a resistivity of 2.96Ωcm was obtained.