Affordable Access

Publisher Website

TEM study of tantalum clusters on Al2O3/NiAl(110)

Authors
Journal
Surface Science
0039-6028
Publisher
Elsevier
Publication Date
Identifiers
DOI: 10.1016/s0039-6028(98)00387-2
Keywords
  • Aluminum Oxide
  • Cluster
  • Energy Dispersive X-Ray Analysis
  • Tantalum
  • Thin Films
  • Transmission Electron Microscopy
  • X-Ray Photoelectron Spectroscopy

Abstract

Abstract Employing transmission electron microscopy (TEM), energy dispersive X-ray analysis (EDX) and X-ray photoelectron spectroscopy (XPS) we have studied tantalum clusters on a thin Al 2O 3 film epitaxially grown on NiAl(110). Our data reveal that the clusters are three dimensional, growing epitaxially on the oxide film with their [110] directions parallel to the surface normal and Ta[001]‖NiAl[001]. From the observed moiré fringes the tantalum lattice constant could be determined as a function of the cluster size. We found that the lattice constant decreases with decreasing cluster size with the highest observed reduction being 4.5% for a cluster with a diameter of 12.5 Å. Interestingly the clusters are only partly oxidized as concluded from XPS, TEM and EDX data although the samples were exposed to air after cluster deposition.

There are no comments yet on this publication. Be the first to share your thoughts.