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In situ characterization of Mn and Fe silicide islands on silicon

Authors
Journal
Surface Science
0039-6028
Publisher
Elsevier
Publication Date
Identifiers
DOI: 10.1016/s0039-6028(03)00213-9
Keywords
  • Electron Microscopy
  • Scanning Tunneling Microscopy
  • Manganese
  • Iron
  • Silicides
  • Surface Structure
  • Morphology
  • Roughness
  • And Topography

Abstract

Abstract The Mn and Fe deposited clean Si(1 1 1) substrates were examined with UHV-TEM and STM that are part of an UHV-TEM/STM integrated characterization system. The Mn deposition with coverages of 5–20 ML followed by annealing at 673 K for 5 min formed MnSi islands. STM image revealed their surface √3×√3 structure. The re-deposition of 10–20 ML Mn and re-annealing at 573 K for 5 min succeeded to transform the MnSi islands into MnSi 1.7. The Fe deposition with coverages of 5–20 ML followed by annealing at 873 K for 5 min formed β-FeSi 2 islands. TEM image of these islands showed Moire fringes in different directions.

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