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Redeposition of backscattered material in a dc magnetron sputtering system

Authors
Journal
Vacuum
0042-207X
Publisher
Elsevier
Publication Date
Volume
40
Issue
3
Identifiers
DOI: 10.1016/0042-207x(90)90038-z

Abstract

Abstract An experimental study has been undertaken to throw more light on the significance of the virtual source, recently considered, in magnetron sputtering systems. Copper targets were sputtered separately in different glow discharge atmospheres of Ar, Ar/O 2 and Ar/N 2 in a magnetron system. Circular coatings of different diameters, colours (thicknesses) and types (metal, metal oxide and metal nitride) were deposited on surface of the copper targets and the formation of such deposits was attributed to the existance of a virtual source in the distance between the target and the substrate. Moreover, it was found that gas type and gas pressure were important parameters in controlling the height of the virtual source and consequently the deposit diameter, type and colour.

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