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45 degree polymer micromirror integration for board-level three-dimensional optical interconnects.

Authors
Type
Published Article
Journal
Optics Express
1094-4087
Publisher
The Optical Society
Publication Date
Volume
17
Issue
13
Pages
10514–10521
Identifiers
PMID: 19550447
Source
Medline
License
Unknown

Abstract

We introduce here a simple method of integrating 45 degrees total internal reflection micro-mirrors with polymer optical waveguides by an improved tilted beam photolithography on printed circuit boards to provide surface normal light coupling between waveguides and optoelectronic devices for optical interconnects. De-ionized water is used to couple ultraviolet beam through the waveguide core polymer layer at 45 degrees angle during the photo exposure process. This technique is compatible with PCB manufacturing facility and suitable to large panel board-level manufacturing. The mirror slope is controlled accurately (within +/- 1 degrees) with high repeatability. The insertion loss of an uncoated micro-mirror is measured to be 1.6 dB.

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