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Helium effusion, diffusion and precipitation as a probe of microstructure in hydrogenated amorphous silicon

Authors
Journal
Journal of Non-Crystalline Solids
0022-3093
Publisher
Elsevier
Publication Date
Identifiers
DOI: 10.1016/s0022-3093(01)01004-3

Abstract

Abstract The effusion of implanted helium was studied for doped and undoped radio frequency plasma-deposited a-Si:H films as well as for Si:H films deposited by other techniques. The results suggest that the observed helium diffusion and precipitation effects give information on the material microstructure.

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