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Formation of patterned tin oxide thin films by ion beam decomposition of metallo-organics

Authors
Journal
Thin Solid Films
0040-6090
Publisher
Elsevier
Publication Date
Volume
188
Issue
1
Identifiers
DOI: 10.1016/0040-6090(90)90189-k

Abstract

Abstract Boron, phosphorus and oxygen ion implantation was used to decompose tin(IV) neodecanoate selectively to form patterned tin oxide thin films on Si/SiO 2 and single-crystal LiNbO 3 substrates. An implantation dose of 5 × 10 14 ions cm −2 at energies above 180 keV rendered the metallo-organic (MO) insoluble to xylene- N-butylacetate, permitting patterning of the MO prior to pyrolysis. Resistivities of 1–2Mω/□ were measured after pyrolysis for 0.25 μm thick patterned film. Linewidths as narrow as 330 μm were formed by this method.

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