Affordable Access

Publisher Website

Characterization of acid diffusion for a negative chemically amplified resist using X-ray proximity lithography

Authors
Journal
Microelectronic Engineering
0167-9317
Publisher
Elsevier
Publication Date
Identifiers
DOI: 10.1016/s0167-9317(98)00069-0
Keywords
  • 1. Lithography
Disciplines
  • Chemistry

Abstract

Abstract We suggest a new method to characterize the acid diffusion phenomena for negative chemically amplified resist (CAR) using X-ray proximity lithography (XRL) in a straightforward manner. By measuring replicated critical dimensions of narrow isolated lines with various post exposure bake (PEB) times at certain PEB temperatures, we can calculate the diffusivity of CAR. This method is applied to the measurement of the diffusivity for TDUR - N908 CAR.

There are no comments yet on this publication. Be the first to share your thoughts.