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Some characteristic properties of NiCr thin films

Authors
Journal
Thin Solid Films
0040-6090
Publisher
Elsevier
Publication Date
Volume
10
Issue
1
Identifiers
DOI: 10.1016/0040-6090(72)90270-2
Disciplines
  • Engineering

Abstract

Abstract This paper reports the results of electrical and electron microscope investigations of vacuum evaporated and cathode sputtered NiCr thin films. Because of its extensive application in thin film technology for the preparation of resistance elements with a low temperature coefficient of resistance the 80:20 NiCr alloy was selected for study. The films were deposited on non-corrosive glass microscope slides, rock salt single crystals and ceramic substrates. The deposition rate was maintained at 9 A ̊ sec . The results show that the electrical characteristics are strongly influenced by the film thickness and Cr concentration. Electron microscope investigations reveal a very fine grain film structure that resembles the microstructure of the substrates. The structural properties of films up to 1000 Å thick, obtained either by vacuum evaporation or cathode sputtering, are very similar.

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