Abstract This paper reports the results of electrical and electron microscope investigations of vacuum evaporated and cathode sputtered NiCr thin films. Because of its extensive application in thin film technology for the preparation of resistance elements with a low temperature coefficient of resistance the 80:20 NiCr alloy was selected for study. The films were deposited on non-corrosive glass microscope slides, rock salt single crystals and ceramic substrates. The deposition rate was maintained at 9 A ̊ sec . The results show that the electrical characteristics are strongly influenced by the film thickness and Cr concentration. Electron microscope investigations reveal a very fine grain film structure that resembles the microstructure of the substrates. The structural properties of films up to 1000 Å thick, obtained either by vacuum evaporation or cathode sputtering, are very similar.