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300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition

Authors
  • Clerix, JJ;
  • Warad, L;
  • Hung, J;
  • Hody, H;
  • Van Roey, F;
  • Lorusso, G;
  • Koret, R;
  • Lee, WT;
  • Shah, K;
  • Delabie, A; 7140;
Publication Date
Jul 30, 2023
Source
Lirias
Keywords
License
Unknown
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