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Critical optimization

Authors
Journal
Thin Solid Films
0040-6090
Publisher
Elsevier
Publication Date
Volume
100
Issue
4
Identifiers
DOI: 10.1016/0040-6090(83)90162-1

Abstract

Abstract Critical optimization is a remarkable recently discovered thin film deposition phenomenon. Its extraordinary reproducibility, its applicability to an extremely wide range of properties and materials, its really accurate (and theoretically explicable) correlation with a simple fundamental property of the materials, and its ability to predict and explain technologically important property optima make it perhaps unique in thin film science. We here present a review, discussing both what is known and what remains to be done; we also propose a possible new mechanism, involving a connection with the “ideal amorphous state”, and point out that critical optimization could be applicable to deposition methods other than the presently considered vacuum evaporation and sputtering, and to an even wider range of materials.

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