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A chemical vapor deposition method for the manufacture of silicon carbide tubes

Authors
Journal
Journal of Alloys and Compounds
0925-8388
Publisher
Elsevier
Publication Date
Volume
184
Issue
2
Identifiers
DOI: 10.1016/0925-8388(92)90496-v
Disciplines
  • Design
  • Physics

Abstract

Abstract An investigation on the deposition of silicon carbide to manufacture silicon carbide tubes from thermal decomposition of CH 3SiCl 3 in a hydrogen atmosphere is presented. A thermodynamic analysis is carried out to obtain the optimum conditions for this operation. A detailed design of the reactors is described. Two critical problems in the operation of the deposition and the solutions are given. A method of carbon coating is used to eliminate the crack induced by the different expansion coefficients of the β-SiC coating and the graphite substrate. The problem of scaling up is discussed.

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