Affordable Access

Publisher Website

A chemical vapor deposition method for the manufacture of silicon carbide tubes

Authors
Journal
Journal of Alloys and Compounds
0925-8388
Publisher
Elsevier
Publication Date
Volume
184
Issue
2
Identifiers
DOI: 10.1016/0925-8388(92)90496-v
Disciplines
  • Design
  • Physics

Abstract

Abstract An investigation on the deposition of silicon carbide to manufacture silicon carbide tubes from thermal decomposition of CH 3SiCl 3 in a hydrogen atmosphere is presented. A thermodynamic analysis is carried out to obtain the optimum conditions for this operation. A detailed design of the reactors is described. Two critical problems in the operation of the deposition and the solutions are given. A method of carbon coating is used to eliminate the crack induced by the different expansion coefficients of the β-SiC coating and the graphite substrate. The problem of scaling up is discussed.

There are no comments yet on this publication. Be the first to share your thoughts.

Statistics

Seen <100 times
0 Comments

More articles like this

Transient stages in the chemical vapor deposition...

on Journal of Nanoscience and Nan... September 2011

Kinetics of halide chemical vapor deposition of si...

on Journal of Crystal Growth Jan 01, 2007

Open-air laser-induced chemical vapor deposition o...

on Surface and Coatings Technolog... Dec 04, 2006
More articles like this..