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Electronic states and structural characterization in single-crystal Fe–Ni–O alloy thin films grown by molecular beam epitaxy

Authors
Journal
Solid State Communications
0038-1098
Publisher
Elsevier
Publication Date
Volume
109
Issue
9
Identifiers
DOI: 10.1016/s0038-1098(98)00596-1
Keywords
  • A. Thin Films
  • C. Nexafs
  • C. X-Ray Scattering
  • E. Synchrotron Radiation

Abstract

Abstract High quality epitaxial Fe 3O 4, NiO and a series of Fe 1− x Ni x O y (0< x<1) thin films have been fabricated by molecular beam epitaxy. In situ reflection high energy electron diffraction (RHEED), ex situ X-ray diffraction (XRD), and X-ray absorption spectroscopy (XAS) studies have been carried out. It was observed that the crystal structure of all the Fe 1− x Ni x O y films studied resemble that of the inverse spinel Fe 3O 4. The lattice spacing along the perpendicular direction as a function of x shows a minimum at x=0.5 instead of a linear variation indicating that the structures are different from a bulk ferrite Fe 2NiO 4-like phase. The XAS results are consistent with XRD results and further identify the cation distribution in Fe 1− x Ni x O y system as x varies. The mechanism of the formation of the metastable phase and its implication on the magnetic properties of these Fe–Ni–O films are briefly discussed.

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