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Microstructural and chemical characterization of the inconel/Ti(N) thin film and multilayer system

Authors
Journal
Journal of X-Ray Science and Technology
0895-3996
Publisher
IOS Press
Publication Date
Volume
5
Issue
1
Identifiers
DOI: 10.1016/s0895-3996(05)80017-5
Disciplines
  • Chemistry

Abstract

Single layer and multilayer films of titanium and Inconel 600 (76 at.% Ni, 16 at.% Cr, 8 at.% Fe) have been prepared by sputtering in argon/nitrogen atmospheres, with nitrogen partial pressures ranging from 0% to 40%. The microstructure and chemistry of the sputtered films were characterized using transmission/high-resolution electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, electron probe microanalysis, and ion beam analysis with MeV helium beams. The microstructure depended on deposition power and individual layer thickness, as well as the sputtering atmosphere composition. Metal nitrides were formed in single layers of both materials whereas, for multilayers, nitrogen was preferentially incorporated into the titanium layer.

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