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Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography

John Wiley & Sons
Publication Date
  • 030300 Macromolecular And Materials Chemistry
  • Functional Materials
  • Lithography
  • Mechanical Properties
  • Polycarbonates
  • Synthesis
  • Chemistry


A series of high-performance polycarbonates have been prepared with glass-transition temperatures and decomposition temperatures that are tunable by varying the repeat-unit chemical structure. Patterning of the polymers with extreme UV lithography has been achieved by taking advantage of direct photoinduced chain scission of the polymer chains, which results in a molecular-weight based solubility switch. After selective development of the irradiated regions of the polymers, feature sizes as small as 28.6 nm have been printed and the importance of resist-developer interactions for maximizing image quality has been demonstrated.

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