Affordable Access

Publisher Website

Wetting kinetics of a hypo-eutectic Al–Si system

Authors
Journal
Materials Letters
0167-577X
Publisher
Elsevier
Publication Date
Volume
62
Issue
15
Identifiers
DOI: 10.1016/j.matlet.2007.11.081
Keywords
  • Wetting
  • Aluminum
  • Brazing

Abstract

Abstract This study is devoted to investigation of spreading of a hypo-eutectic Al 8Si system over a flat Al surface. Wetting kinetics was studied using a real time in situ monitoring of the triple line movement facilitated by a hot-stage microscopy system under controlled atmosphere. Analysis of the validity of the classic Tanner's law correlation developed for inert wetting systems is performed. A good agreement of the power relationship between the triple line location and time was established. The dispersion of the n-power exponent magnitude is between 9 and 13, with an average value of 11.

There are no comments yet on this publication. Be the first to share your thoughts.

Statistics

Seen <100 times
0 Comments

More articles like this

Wetting kinetics and bonding of Al and Al alloys o...

on Materials Science and Engineer... Jan 01, 1996

Eutectic nucleation in hypoeutectic Al-Si alloys

on Materials Characterization Jan 01, 2008
More articles like this..