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RBS/Simulated Annealing and FTIR characterisation of boron-carbon-nitride films deposited by dual cathode magnetron sputtering

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RBS/Simulated Annealing and FTIR characterisation of boron-carbon-nitride films deposited by dual cathode magnetron sputtering - DTU Orbit (20/04/14) RBS/Simulated Annealing and FTIR characterisation of boron-carbon-nitride films deposited by dual cathode magnetron sputtering - DTU Orbit (20/04/14) RBS/Simulated Annealing and FTIR characterisation of boron-carbon-nitride films deposited by dual cathode magnetron sputtering General information State: Published Authors: Barradas, N. (Ekstern), Jeynes, C. (Ekstern), Kusano, Y. (Intern), Evetts, J. (Ekstern), Hutchings, I. (Ekstern) Pages: 504-507 Publication date: 1999 Host publication information Title: Proceedings of 15th International Conference on the Application of Accelerators in Research and Industry (CAARI '98) Editors: Duggan, J., Morgan, I. Main Research Area: Technical/natural sciences Conference: 15th International Conference on the Application of Accelerators in Research and Industry (CAARI '98), Denton, TX, United States, 04/11/98 - 04/11/98 Publication: Research - peer-review › Article in proceedings – Annual report year: 1999

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