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Parallel beam ion implanter: IPX-7000

Authors
Journal
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
0168-583X
Publisher
Elsevier
Publication Date
Volume
55
Identifiers
DOI: 10.1016/0168-583x(91)96204-x

Abstract

Abstract As the wafer size increases from 6 to 8 in. and device integration develops into 4 and 16 Mbit levels, the ability to provide parallel beam ion implantation becomes more important. The parallel beam ion implanter, IPX-7000, has been developed by ULVAC Japan Ltd. ULVAC's parallel beam scan system has eliminated all mechanical scan drives and has replaced them with electrical scanning by multipole parallel scanner. This paper describes the basic principle of our parallel scanning system and the performance of the IPX-7000.

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