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Copolymer electron resists: poly(stryene-methyl methacrylate) copolymers

Authors
Journal
Polymer
0032-3861
Publisher
Elsevier
Publication Date
Volume
24
Issue
4
Identifiers
DOI: 10.1016/0032-3861(83)90022-8
Keywords
  • Poly(Methyl Methacrylate)
  • Polystyrene
  • Copolymers
  • Resists
  • Alternating Copolymer
  • Electron Beam

Abstract

Abstract The factors influencing electron beam sensitivity are reviewed. The variation of electron beam sensitivity and constrast are reported for a series of random copolymers of styrene and methyl methacrylate. Data are also presented for an alternating copolymer of styrene and methyl methacrylate. This study indicates the effects which arise when a negative resist material, polystyrene, is incorporated into a positive resist material, poly(methyl methacrylate).

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