Abstract Using low energy electron diffraction and low energy ion scattering spectroscopy, we investigated the growth mode of Al on a W(110) surface at room temperature and at 1000K. We found that Al grew on the W(110) surface in the Frank–van der Merwe mode when the W substrate was kept at room temperature during Al deposition. It was found that at a coverage higher than 2monolayer (ML) in Al grown at room temperature, Al atoms had a well-ordered face centered cubic (fcc) (111) surface. The [11¯0] direction of the Al grown at room temperature on the (111) surface was parallel to the  direction of the W(110) substrate surface. When the temperature of the W substrate was kept at 1000K, the adsorbed Al atoms grew in the Volmer–Weber mode. The 1.5ML Al/W(110) surface prepared at 1000K shows two domains of the fcc Al(111) surfaces along with a W(110) surface. We also found that the early stage of Al film growth shows W(110) structure. However as the film becomes thicker (above 3.5–4 layers) the Al face is turned into fcc (111) face.