Otaka, Michihiro Otomo, Hiroshi Ikeda, Kizuku Lai, Jian-Syun Wakita, Daichi Kamataki, Kunihiro Koga, Kazunori Shiratani, Masaharu Nagamatsu, Daiki Shindo, Takahiro
...
Published in
Japanese Journal of Applied Physics
We investigated the effects of tailored voltage waveform (TVW) discharges on the deposition of hydrogenated amorphous carbon (a-C:H) films in CH4/Ar capacitively coupled plasma. TVW discharges employ two driving radio frequencies (13.56 MHz and 27.12 MHz) and control their phase shifts to independently regulate ion bombardment energy (IBE) and ion ...
Kim, Ho Jun Lee, Kyungjun Park, Hwanyeol
Published in
Plasma Sources Science and Technology
This paper presents the results of our numerical analysis to optimize the dielectric properties to achieve process uniformity in the thin film deposition process using capacitively coupled plasma. The difference in the plasma density distribution was analyzed by changing the wafer material from silicon to quartz (or Teflon). Similarly, aluminum was...
Kim, Ho Jun Lee, Kyungjun Park, Hwanyeol
Published in
Plasma Sources Science and Technology
In this study, we focus on the difference in the spatial distribution of the plasma parameters between SiH4/He capacitively coupled plasma (CCP) and SiH4/Ar CCP. The SiH4/He mixture is modeled using the chemical reactions that were successfully derived in our previous studies. The chemical reaction model of the SiH4/Ar mixture built in this study i...
Snyders, R Hegemann, D Thiry, D Zabeida, O Klemberg-Sapieha, J Martinu, L
Published in
Plasma Sources Science and Technology
Since decades, the PECVD (‘plasma enhanced chemical vapor deposition’) processes have emerged as one of the most convenient and versatile approaches to synthesize either organic or inorganic thin films on many types of substrates, including complex shapes. As a consequence, PECVD is today utilized in many fields of application ranging from microele...
de Vrijer, Thierry Bouazzata, Bilal Ravichandran, Ashwath van Dingen, Julian E C Roelandschap, Paul J Roodenburg, Koos Roerink, Steven J Saitta, Federica Blackstone, Thijs Smets, Arno H M
...
Published in
Advanced science (Weinheim, Baden-Wurttemberg, Germany)
In this paper the opto-electrical nature of hydrogenated group IV alloys with optical bandgap energies ranging from 1.0 eV up to 2.3 eV are studied. The fundamental physical principles that determine the relation between the bandgap and the structural characteristics such as material density, elemental composition, void fraction and crystalline pha...
moreno;, i mario
Hydrogenated microcrystalline silicon (µc-Si:H) and epitaxial silicon (epi-Si) films have been produced from SiF4, H2 and Ar mixtures by plasma enhanced chemical vapor deposition (PECVD) at 200 °C. Here, both films were produced using identical deposition conditions, to determine if the conditions for producing µc-Si with the largest crystalline fr...
horňák;, peter
In this paper, we present the results of an experimental study on WC/C coatings, deposited by using plasma-enhanced chemical vapor deposition in an N2-SiH4 atmosphere, annealed at temperatures of 200, 500 and 800 °C, in which the hexacarbonyl of W was used as a precursor. During the experiments, the topography, chemical composition, morphology, as ...
Zietz, Otto Olson, Samuel Coyne, Brendan Liu, Yilian Jiao, Jun
Published in
Nanomaterials
To develop a synthesis technique providing enhanced control of graphene film quality and uniformity, a systematic characterization and manipulation of hydrocarbon precursors generated during plasma enhanced chemical vapor deposition of graphene is presented. Remote ionization of acetylene is observed to generate a variety of neutral and ionized hyd...
Cheng, Chih-Hsien Lin, Gong-Ru
Published in
Materials
This paper reviews the developing progress on the synthesis of the silicon quantum dots (Si-QDs) via the different methods including electrochemical porous Si, Si ion implantation, and plasma enhanced chemical vapor deposition (PECVD), and exploring their featured applications for light emitting diode (LED), color-converted phosphors, and waveguide...
Alancherry, Surjith Bazaka, Kateryna Levchenko, Igor Al-Jumaili, Ahmed Kandel, Bigyan Alex, Aaron Robles Hernandez, Francisco C Varghese, Oomman K Jacob, Mohan V
Published in
ACS applied materials & interfaces
Graphene and its derivatives have acquired substantial research attention in recent years because of their wide range of potential applications. Implementing sustainable technologies for fabricating these functional nanomaterials is becoming increasingly apparent, and therefore, a wide spectrum of naturally derived precursors has been identified an...
