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VI/II ratio-dependent growth and photoluminescence of cubic CdSe epilayers by molecular beam epitaxy

CdSe epilayers were grown on GaAs(0 0 1) substrates by molecular beam epitaxy (MBE) in a wide range of VI/II beam-equivalent-pressure (BEP) ratio from 1.1 to 8.5. X-ray diffraction (XRD) theta-2 theta scan reveals all the CdSe samples possess cubic zinc blende structure with (0 0 1) orientation. The film grown at a low VI/II ratio of 1.1 has rough ...

Growth and annealing of zinc-blende CdSe thin films on GaAs (001) by molecular beam epitaxy

CdSe thin films have been grown on GaAs (0 0 1) substrates by molecular beam epitaxy (MBE). The effects of substrate temperature and annealing treatment on the structural properties of CdSe layers were investigated. The growth rate slightly decreases due to the accelerated desorption of Cd from CdSe surface with an increase in the temperature. The ...

The effect of different oriented sapphire substrates on the growth of polar and non-polar ZnMgO by MOCVD

Investigation of cracks in GaN films grown by combined hydride and metal organic vapor-phase epitaxial method

Formation of silicon nanocrystals embedded in high-kappa dielectric HfO2 and their application for charge storage

Effect of gas pressure on the properties of silicon thin film

A series of transition films from amorphous to microcrystalline silicon was successfully prepared by very high frequency plasma enhanced chemical vapor deposition(VHF-PECVD).Effects of gas pressure on the microstructure, photoelectric and transport properties of the films were investigated.The results indicate that increase of gas pressure improve ...

Multi-wafer3C-SiC thin films grown on Si(100) in a vertical HWLPCVD reactor

We report the latest results of the3C-SiC layer growth on Si(100) substrates by employing a novel home-made horizontal hot wall low pressure chemical vapour deposition(HWLPCVD) system with a rotating susceptor that was designed to support up to three50 mm-diameter wafers.3C-SiC film properties of the intra-wafer and the wafer-to-wafer, including cr...

Improved electroluminescence from n-ZnO/AlN/p-GaN heterojunction light-emitting diodes

n-ZnO/p-GaN heterojunction light-emitting diodes with and without a sandwiched AlN layer were fabricated. The electroluminescence (EL) spectrum acquired from the n-ZnO/p-GaN displays broad emission at 650 nm originating from ZnO and weak emission at 440 nm from GaN, whereas the n-ZnO/AlN/p-GaN exhibits strong violet emission at 405 nm from ZnO with...

Effects of AlGaN/AlN Stacked Interlayers on GaN Growth on Si (111)

We report the growth of high quality and crack-free GaN film on Si (111) substrate using Al0.2Ga0.8N/AlN stacked interlayers. Compared with the previously used single AlN interlayer, the AlGaN/AlN stacked interlayers can more effectively reduce the tensile stress inside the GaN layer. The cross-sectional TEM image reveals the bending and annihilati...

Influence of AlN buffer layer thickness on structural properties of GaN epilayer grown on Si (111) substrate with AlGaN ...

We present the growth of GaN epilayer on Si (111) substrate with a single AlGaN interlayer sandwiched between the GaN epilayer and AlN buffer layer by using the metalorganic chemical vapour deposition. The influence of the AlN buffer layer thickness on structural properties of the GaN epilayer has been investigated by scanning electron microscopy, ...