Published in Russian Microelectronics
AbstractThe possibilities of the spectral ellipsometry method for precise measurements in the development and study of technological processes of atomic-layer deposition in microelectronics are investigated. The applicability of the method to thin dielectric layers of microelectronic devices is shown. The measurement results are given in situ for p...
Rozvoj mikroeletrotechnického průmyslu vede ke zmenšování rozměrů polovodičových součástek, a proto vyvstává poptávka po materiálech z tenkých vrstev. Využití metody depozice atomárních vrstev přineslo vlnu zájmu díky jejím výhodám oproti tradičním depozičním technikám. ALD je chemická metoda depozice z plynné fáze založená na opakovaných samo-nasy...
Published in Nanomaterials (Basel, Switzerland)
Tantalum (Ta)-doped titanium oxide (TiO2) thin films are grown by plasma enhanced atomic layer deposition (PEALD), and used as both an electron transport layer and hole blocking compact layer of perovskite solar cells. The metal precursors of tantalum ethoxide and titanium isopropoxide are simultaneously injected into the deposition chamber. The Ta...
Among the noble metals, silver (Ag) presents the lowest electrical resistivity at low thickness, the highest reflectance from visible to infrared spectra and the lowest thermal conductivity. Consequently, it is used in a large range of applications, either as nanoparticle (NP) films, e.g. in devices based on localized surface plasmon resonance, or ...
Published in ACS applied materials & interfaces
Ruthenium (Ru) thin films deposited via atomic layer deposition (ALD) with a normal sequence and discrete feeding method (DFM) and their performance as a bottom electrode of dynamic random-access memory (DRAM) capacitors were compared. The DFM-ALD was performed by dividing the Ru feeding and purge steps of the conventional ALD process into four ste...
Published in High Temperature Materials and Processes
Al2O3 nano-scaled coating was prepared on micro-textured YT5 cemented carbide cutting tools by atomic layer deposition ALD. The effect of Al2O3 nano-scaled coating, with and without combined action of texture, on the cutting performance was studied by orthogonal cutting test. The results were compared with micro-textured cutting tool and YT5 cuttin...
Published in Frontiers in Physics
Monte Carlo (MC) and kinetic Monte Carlo (kMC) models are widely used for studying the physicochemical surface phenomena encountered in most deposition processes. This spans from physical and chemical vapor deposition to atomic layer and electrochemical deposition. MC and kMC, in comparison to popular molecular methods, such as Molecular Mechanics/...
Published in Frontiers in Energy Research
As a conventional electrode material of electric double-layer capacitors (EDLC), activated carbon (AC) still faces challenges to exhibit high capacitance. To address this problem, herein, we introduce a combined method of oxygen plasma and Al2O3 tomic layer deposition (ALD) on AC electrodes to reduce the impedance and improve the cycle stability of...
Published in ChemistryOpen
The Cover Feature shows the TEM image of activated carbon surface coated with aluminum oxide using the atomic layer deposition technique. The ultra‐thin oxide coating of 5 nm or less is sufficient to stabilize the cycling performance of activated carbon based electric double layer supercapacitor under 4 V through enhanced barrier against ion diffus...
Published in ACS Nano
Ideal controlled pulmonary drug delivery systems provide sustained release by retarding lung clearance mechanisms and efficient lung deposition to maintain therapeutic concentrations over prolonged time. Here, we use atomic layer deposition (ALD) to simultaneously tailor the release and aerosolization properties of inhaled drug particles without th...
