Published in Nano letters
We have combined atomic layer lithography and template stripping to produce a new class of substrates for surface-enhanced infrared absorption (SEIRA) spectroscopy. Our structure consists of a buried and U-shaped metal-insulator-metal waveguide whose folded vertical arms efficiently couple normally incident light. The insulator is formed by atomic ...
Published in Journal of clinical medicine
Amylin (also called islet amyloid polypeptide (IAPP)) is a pancreatic beta-cell hormone that is co-secreted with insulin in response to nutrient stimuli. The last 35 years of intensive research have shown that amylin exerts important physiological effects on metabolic control. Most importantly, amylin is a physiological control of meal-ending satia...
Published in Microscopy research and technique
Thin films of bismuth and iron oxides were obtained by atomic layer deposition (ALD) on the surface of a flexible substrate poly(4,4'-oxydiphenylene-pyromellitimide) (Kapton) at a temperature of 250°C. The layer thickness was 50 nm. The samples were examined by secondary-ion mass spectrometry, and uniform distribution of elements in the film layer ...
Published in Nanotechnology Reviews
The use of computational modelling and simulation methodologies has grown in recent years as researchers try to understand the atomic layer deposition (ALD) process and create new microstructures and nanostructures. This review article explains and simplifies two simulation methodologies, molecular dynamics and the density functional theory (DFT), ...
Published in Journal of Physics D: Applied Physics
Metal-oxide-semiconductor light-emitting devices (MOSLEDs) based on the erbium doped Al2O3 nanofilms still suffer from insufficient and unstable electrical injection, and the dielectric protection layers play an important role in their performance. Here, Ga2O3/TiO2 (GTO) nanolaminate films are fabricated by atomic layer deposition, the dielectric c...
Published in Plasma Sources Science and Technology
For atomic scale plasma processing involving precise, (an)isotropic and selective etching and deposition, it is required to precisely control the energy of the plasma ions. Tailored waveforms have been employed to bias the substrate table to accurately control this ion energy. Recent research has shown that switched-mode power converters can be use...
Published in Materials (Basel, Switzerland)
Due to the chemically inert surface of MoS2, uniform deposition of ultrathin high-κ dielectric using atomic layer deposition (ALD) is difficult. However, this is crucial for the fabrication of field-effect transistors (FETs). In this work, the atomic layer deposition growth of sub-5 nm La2O3/Al2O3 nanolaminates on MoS2 using different oxidants (H2O...
Published in Japanese Journal of Applied Physics
We investigated the effects of different growth facets of 6H-SiC and different voltage waveforms on the porous structure and luminescence properties. The structure formed on the surface after anodic etching significantly changed because of the difference in the growth plane, whereas dendritic and columnar pores were observed inside the Si- and C-fa...
Published in 2D Materials
The self-limiting nature of atomic layer deposition (ALD) makes it an appealing option for growing single layers of two-dimensional van der Waals (2D-VDW) materials. In this paper it is demonstrated that a single layer of a 2D-VDW form of SiO2 can be grown by ALD on Au and Pd polycrystalline foils and epitaxial films. The silica was deposited by tw...
Electrocatalytic water splitting, which is an interface-dominated process, can be significantly accelerated by increasing the number of front-line surface active sites (N-A) of the electrocatalyst. In this study, a unique method is used for increasing the N-A by converting the smooth ultrathin atomic-layer-deposited nanoshells of the electrocatalys...
