Les dépôts chimiques en phase vapeur assistés par plasma froids à basse pression (Plasma Enhanced Chemical Vapor Deposition) consistent à réaliser des dépôts de matériaux diélectriques en couches minces sur un substrat solide tel que le silicium, le verre ou l’arséniure de gallium, pour exemples. Parmi les différentes techniques PECVD, la technique...
Dans le but d’améliorer les performances mécaniques des composites à fibres de basalte et matrice époxy, différents types de traitement des fibres de basalte ont été comparés: un ensimage commercial, un traitement thermique capable d’éliminer cette couche d'ensimage et un procède de polymérisation par plasma.Les fibres de basalte ont été caractéris...
Textiles for the food industry were treated with an original deposition technique based on a combination of Plasma Enhanced Chemical Vapor Deposition and Physical Vapor Deposition to obtain nanometer size silver clusters incorporated into a SiOCH matrix. The optimization of plasma deposition parameters (gas mixture, pressure, and power) was focused...
The plasma enhanced chemical vapor deposition(PECVD) system was used for fabricating the silicon films with different hydrogen dilution ratio(RH) under the high power density, high pressure and low substrate temperature. High-resolution transmission electron microscopy(HRTEM) and Raman spectroscopy indicated that the thin films were nanocrystalline...
A series of transition films from amorphous to microcrystalline silicon was successfully prepared by very high frequency plasma enhanced chemical vapor deposition(VHF-PECVD).Effects of gas pressure on the microstructure, photoelectric and transport properties of the films were investigated.The results indicate that increase of gas pressure improve ...
[[abstract]]本研究使用電漿輔助式化學氣相沈積(Plasma Enhanced Chemical Vapor Deposition, PECVD)製備一非晶矽(Amorphous Silicon, a-Si)薄膜，並利用金屬誘發結晶法(Metal Induced Crystallization, MIC)，在退火溫度350°C條件下，使其非晶矽薄膜轉變成多晶矽薄膜，以便日後作為薄膜電晶體(Thin Film Transistors, TFT）及薄膜太陽能電池(Thin Film Solar Cell, TF-SC）之應用。本實驗藉由改變退火時間及非晶矽薄膜厚度作為實驗參數，探討退火時間對蒸鍍鋁誘發多晶矽薄膜之影響。此外，本研究藉由光學顯微鏡、場放射型掃瞄式電子顯微鏡、原子力顯微鏡、...
Purified and defect free carbon nanotubes have great potential for applications in electronic, polymer composites and biological sciences. The removal of impurities (carbon nanoparticles and amorphous carbon) is an important step before the CNT applications can be realized. We report the results of FTIR and TGA/DTA studies of the impurities present...
