Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
Titanium phosphate thin films were deposited by a new plasma-enhanced atomic layer deposition process. The process consisted of sequential exposures to trimethyl phosphate (TMP, Me3PO4) plasma, O-2 plasma and titanium isopropoxide (TTIP, Ti(OCH(CH3)(2))(4)) vapor, and it was characterized by in situ spectroscopic ellipsometry and ex situ X-ray refl...
A new plasma-enhanced atomic layer deposition process was developed to deposit iron phosphate by using a sequence of trimethyl phosphate (TMP, Me3PO4) plasma, O-2 plasma, and tert-butylferrocene (TBF, Fe(C5H5)(C5H4C-(CH3)(3))) exposures. Using in situ spectroscopic ellipsometry and ex situ X-ray reflectometry, the growth linearity, growth per cycle...
The effects of H3PO4 on the compressive strength of block CaO, phase composition and morphology of calcined carbide slag were investigated. The results indicated that block CaO could be prepared from carbide slag through molding and calcination. H3PO4 had a promotive effect on the compressive strength of block CaO, which reached the maximum value a...
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Published in Rivista dell'Istituto sieroterapico italiano
Published in The Medical journal of Australia
Published in The New England journal of medicine
Published in Sicilia sanitaria